Achieving low-temperature Cu–Cu bonding platform via area-selective metal films with superior surface roughness for advanced packaging

This study addresses the critical challenge of achieving low-temperature Cu–Cu bonding for advanced packaging applications by optimizing area-selective electroless Au passivation. We demonstrate that an Ar/N2 plasma pretreatment, applied prior to Au deposition, substantially strips oxides, renders t...

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Bibliographic Details
Main Authors: Mu-Ping Hsu, Chi-Yu Chen, Hsin-Chi Chang, Kuan-Neng Chen
Format: Article
Language:English
Published: Elsevier 2025-05-01
Series:Journal of Materials Research and Technology
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785425011950
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