Wafer Defect Classification Algorithm With Label Embedding Using Contrastive Learning
Classifying wafer defects in the wafer manufacturing process is increasingly critical for ensuring high-quality production, optimizing processes, and reducing costs. Most existing methods for wafer map defect classification primarily rely on images alone for model training and prediction. However, t...
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| Main Authors: | Jeongjoon Hwang, Somi Ha, Dohyun Kim |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10835094/ |
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