Wafer Defect Classification Algorithm With Label Embedding Using Contrastive Learning

Wafer Defect Classification Algorithm With Label Embedding Using Contrastive Learning

Classifying wafer defects in the wafer manufacturing process is increasingly critical for ensuring high-quality production, optimizing processes, and reducing costs. Most existing methods for wafer map defect classification primarily rely on images alone for model training and prediction. However, t...

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Bibliographic Details
Main Authors: Jeongjoon Hwang, Somi Ha, Dohyun Kim
Format: Article
Language:English
Published: IEEE 2025-01-01
Series:IEEE Access
Subjects:
Deep learning
image classification
wafer defect classification
contrastive learning
label embedding
Online Access:https://ieeexplore.ieee.org/document/10835094/
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https://ieeexplore.ieee.org/document/10835094/

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