Data processing capability of polarization dynamics in ferroelectric-gate transistor-based physical reservoir computing

We investigated the relationship between the polarization characteristics of ferroelectric Hf _0.5 Zr _0.5 O _2 thin-films and data processing capability in physical reservoir computing. Ferroelectric-gate field-effect transistors (FeFETs) with a metal-ferroelectric-metal-insulator-semiconductor str...

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Bibliographic Details
Main Authors: Yu Ukezeki, Sota Inoue, Norifumi Fujimura, Tokuji Yokomatsu, Kensuke Kanda, Kazusuke Maenaka, Kasidit Toprasertpong, Shinichi Takagi, Takeshi Yoshimura
Format: Article
Language:English
Published: IOP Publishing 2025-01-01
Series:Applied Physics Express
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Online Access:https://doi.org/10.35848/1882-0786/adf372
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Summary:We investigated the relationship between the polarization characteristics of ferroelectric Hf _0.5 Zr _0.5 O _2 thin-films and data processing capability in physical reservoir computing. Ferroelectric-gate field-effect transistors (FeFETs) with a metal-ferroelectric-metal-insulator-semiconductor structure were employed with varying area ratios between the ferroelectric capacitors and floating gate-electrodes. The voltage applied to the ferroelectric layers was theoretically calculated using load line analysis and determined experimentally. In a time-series prediction task, the FeFETs showed low error rates under conditions that produced multiple hysteresis loops in dynamic transfer waveforms. The results indicate that data processing capability is improved when a substantial portion of polarization is switched.
ISSN:1882-0786