High-order near-field imaging of low-dimensional materials at infrared wavelengths

Abstract Near-field imaging provides insight into the fundamental light-matter interactions on a nanometer scale. Scattering-type scanning near-field optical microscopy (s-SNOM) is a powerful technique capable of overcoming the diffraction limit and achieving spatial resolutions below 10 nm (sub-10...

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Bibliographic Details
Main Authors: Shuhao Zhao, Peirui Ji, Fei Wang, Shaobo Li, Guofeng Zhang, Tao Liu, Shuming Yang
Format: Article
Language:English
Published: Nature Publishing Group 2025-06-01
Series:Microsystems & Nanoengineering
Online Access:https://doi.org/10.1038/s41378-025-00953-z
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Summary:Abstract Near-field imaging provides insight into the fundamental light-matter interactions on a nanometer scale. Scattering-type scanning near-field optical microscopy (s-SNOM) is a powerful technique capable of overcoming the diffraction limit and achieving spatial resolutions below 10 nm (sub-10 nm). However, constrained by the working mechanisms, the signal-to-noise ratio of the imaging is highly affected by undesired background scattering light, which is found to be associated with the optical mode and excitation wavelength, especially for samples with a large specific surface area. Here, we propose a high-resolution method with high-order near-field modes at the infrared range to measure low-dimensional materials. With this technique, we reveal the excitation and propagation of the surface plasmon polaritons in graphene and carbon nanotubes, which was impossible with the low-order imaging approach. Besides, the imaging quality for gold nanoparticles on gold thin film is much better than the AFM results. This paper offers an advanced approach for high-resolution measurement of low-dimensional materials with s-SNOM, owning great potential for sensitive nanoscale imaging.
ISSN:2055-7434