Microcrystalline-Silicon-Oxide-Based N-Type Reflector Structure in Micromorph Tandem Solar Cells
N-type microcrystalline silicon oxide thin films (n-𝜇c-SiO𝑥:H) have been deposited by VHF-PECVD (40 MHz) with reactant gas mixtures of CO2/SiH4 and H2. N-𝜇c-SiO𝑥 thin films exhibiting low refractive index value (n600nm∼2), and medium/high conductivity (≧10−9 S/cm) are suitable to be used as an “n-ty...
Saved in:
| Main Authors: | , , , , , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2012-01-01
|
| Series: | International Journal of Photoenergy |
| Online Access: | http://dx.doi.org/10.1155/2012/513238 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|