High-energy argon implantation in carbon nanowalls as a way to produce electrodes for supercapacitor applications

High-energy argon implantation in carbon nanowalls as a way to produce electrodes for supercapacitor applications

Abstract While ion implantation is a well-established technology in microelectronics, its potential for modifying carbon-based electrochemical energy storage materials remains underexplored. This study breaks new ground by demonstrating high-energy (40 keV) argon ion implantation as an effective str...

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Main Authors: J. V. Bondareva, S. A. Smirnov, D. O. Potapov, D. A. Chernodubov, O. N. Dubinin, K. I. Maslakov, T. B. Egorova, A. A. Shibalova, M. A. Tarkhov, R. A. Khmelnitsky, V. A. Dravin, N. D. Orekhov, X. Shi, F. S. Fedorov, S. A. Evlashin
Format: Article
Language:English
Published: Nature Portfolio 2025-07-01
Series:Scientific Reports
Subjects:
Ion implantation
Argon implantation
Carbon nanowalls
Capacitance
Supercapacitor
Online Access:https://doi.org/10.1038/s41598-025-03770-6
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https://doi.org/10.1038/s41598-025-03770-6

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