Investigation on fabrication of silicon nanopores using an electrochemical passivation etch-stop strategy
Abstract The three-step wet etching (TSWE) method has been proven to be a promising technique for fabricating silicon nanopores. Despite its potential, one of the bottlenecks of this method is the precise control of the silicon etching and etch-stop, which results in obtaining a well-defined nanopor...
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| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group
2025-06-01
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| Series: | Microsystems & Nanoengineering |
| Online Access: | https://doi.org/10.1038/s41378-025-00973-9 |
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