PENGARUH TEMPERATUR DEPOSISI PADA PENUMBUHAN FILM TIPIS SILIKON KARBIDA DENGAN METODE HOMEMADE HOT-MESH CHEMICAL VAPOR DEPOSITION

PENGARUH TEMPERATUR DEPOSISI PADA PENUMBUHAN FILM TIPIS SILIKON KARBIDA DENGAN METODE HOMEMADE HOT-MESH CHEMICAL VAPOR DEPOSITION

<p class="IsiAbstrakIndo"><span lang="EN-GB">Film tipis silikon karbida (SiC) telah ditumbuhkan di atas <em>substrate</em> <em>graphene</em>/SiO2/Si dengan metode <em>Homemade Hot-mesh</em> chemical vapor deposition (Hot-Mesh CVD)....

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Bibliographic Details
Main Authors: B Astuti, A M Hashim
Format: Article
Language:English
Published: Universitas Negeri Semarang 2016-03-01
Series:Jurnal MIPA
Subjects:
SiC thin film, Hot-Mesh CVD, Deposition temperature
Online Access:https://journal.unnes.ac.id/nju/index.php/JM/article/view/5484
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https://journal.unnes.ac.id/nju/index.php/JM/article/view/5484

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