Atomic Layer Deposition of Nickel Oxides as Electrocatalyst for Oxygen Evolution Reaction

In this study, we present atomic layer deposition (ALD) of nickel oxides (NiO<sub>x</sub>) using a new nickel precursor, (methylcyclopentadienyl)(cyclopentadienyl)nickel (NiCp(MeCp)), and ozone (O<sub>3</sub>) as the oxygen source. The process features a relatively short satu...

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Bibliographic Details
Main Authors: Jueyu Chen, Ruijie Dai, Hongwei Ma, Zhijie Lin, Yuanchao Li, Bin Xi
Format: Article
Language:English
Published: MDPI AG 2025-03-01
Series:Nanomaterials
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Online Access:https://www.mdpi.com/2079-4991/15/7/474
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