Computer Simulation of Metal Ions Transport to Uneven Substrates during Ionized Plasma Vapour Deposition
We present a computational study of processes taking place in a sheath region formed near a negatively biased uneven substrate during ionized plasma vapour deposition. The sputtered metal atoms are ionized on their way to substrate and they are accelerated in the sheath near the substrate. They are...
Saved in:
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2017-01-01
|
| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2017/4283547 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|