An Improved YOLOv5 Model for Lithographic Hotspot Detection

The gap between the ever-shrinking feature size of integrated circuits and lithographic manufacturing ability is causing unwanted shape deformations of printed layout patterns. The deformation region with problematic imaging, known as a hotspot (HS), should be detected and corrected before mask manu...

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Bibliographic Details
Main Authors: Mu Lin, Wenjing He, Jiale Liu, Fencheng Li, Jun Luo, Yijiang Shen
Format: Article
Language:English
Published: MDPI AG 2025-05-01
Series:Micromachines
Subjects:
Online Access:https://www.mdpi.com/2072-666X/16/5/568
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