Analysis of Random Variation in Subthreshold FGMOSFET

The analysis of random variation in the performance of Floating Gate Metal Oxide Semiconductor Field Effect Transistor (FGMOSFET) which is an often cited semiconductor based electronic device, operated in the subthreshold region defined in terms of its drain current (ID), has been proposed in this r...

Full description

Saved in:
Bibliographic Details
Main Author: Rawid Banchuin
Format: Article
Language:English
Published: Wiley 2016-01-01
Series:Active and Passive Electronic Components
Online Access:http://dx.doi.org/10.1155/2016/3741250
Tags: Add Tag
No Tags, Be the first to tag this record!