An analytical method for evaluating the transient swelling layer during polymer film development using quartz crystal microbalance

An analytical method for evaluating the transient swelling layer during polymer film development using quartz crystal microbalance

During the lithography development process, the resist films absorb developer molecules and transiently swell before dissolving. This swelling layer is crucial for resist pattern formation. However, an effective method for analyzing the transient swelling layer is lacking. In this study, we report a...

Full description

Saved in:
Bibliographic Details
Main Authors: Takahiro Kozawa, Kyoko Watanabe, Yuko Tsutsui Ito, Mikiko Kozawa, Yuqing Jin, Kayoko Cho, Takashi Hasebe, Kazuo Sakamoto, Makoto Muramatsu
Format: Article
Language:English
Published: IOP Publishing 2025-01-01
Series:Applied Physics Express
Subjects:
lithography
development process
QCM
diffusion
dissolution
transient swelling layer
Online Access:https://doi.org/10.35848/1882-0786/adcef9
Tags: Add Tag
No Tags, Be the first to tag this record!

Internet

https://doi.org/10.35848/1882-0786/adcef9

Similar Items