Effect of voltage on electrochemical mechanical polishing (ECMP) of 4H–SiC with fixed abrasives

This study employs the fixed agglomerated diamond abrasive pad (FADAP) to enhance the processing efficiency and surface quality of 4H–SiC. The effects of voltage on real-time current density, interface resistance, material removal rate (MRR), and surface roughness Ra during the electrochemical mecha...

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Bibliographic Details
Main Authors: Pengfei Wu, Dongdong Zhao, Ning Liu, Chao Tang, Jun Li, Yongwei Zhu
Format: Article
Language:English
Published: Elsevier 2025-05-01
Series:Journal of Materials Research and Technology
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2238785425011809
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