Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates
Direct chemical vapor deposition (CVD) growth of hexagonal boron nitride (h-BN) on insulating substrates offers a promising pathway to circumvent transfer-induced defects and enhance device integration. This comprehensive review systematically evaluates recent advances in CVD techniques for h-BN syn...
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| Language: | English |
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MDPI AG
2025-07-01
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| Series: | Nanomaterials |
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| Online Access: | https://www.mdpi.com/2079-4991/15/14/1059 |
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| author | Hua Xu Kai Li Zuoquan Tan Jiaqi Jia Le Wang Shanshan Chen |
| author_facet | Hua Xu Kai Li Zuoquan Tan Jiaqi Jia Le Wang Shanshan Chen |
| author_sort | Hua Xu |
| collection | DOAJ |
| description | Direct chemical vapor deposition (CVD) growth of hexagonal boron nitride (h-BN) on insulating substrates offers a promising pathway to circumvent transfer-induced defects and enhance device integration. This comprehensive review systematically evaluates recent advances in CVD techniques for h-BN synthesis on insulating substrates, including metal–organic CVD (MOCVD), low-pressure CVD (LPCVD), atmospheric-pressure CVD (APCVD), and plasma-enhanced CVD (PECVD). Key challenges, including precursor selection, high-temperature processing, achieving single-crystalline films, and maintaining phase purity, are critically analyzed. Special emphasis is placed on comparative performance metrics across different growth methodologies. Furthermore, crucial research directions for future development in this field are outlined. This review aims to serve as a reference for advancing h-BN synthesis toward practical applications in next-generation electronic and optoelectronic devices. |
| format | Article |
| id | doaj-art-4e9a3c7f181c471c9855749399464a0e |
| institution | Kabale University |
| issn | 2079-4991 |
| language | English |
| publishDate | 2025-07-01 |
| publisher | MDPI AG |
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| series | Nanomaterials |
| spelling | doaj-art-4e9a3c7f181c471c9855749399464a0e2025-08-20T03:56:45ZengMDPI AGNanomaterials2079-49912025-07-011514105910.3390/nano15141059Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating SubstratesHua Xu0Kai Li1Zuoquan Tan2Jiaqi Jia3Le Wang4Shanshan Chen5Beijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, ChinaBeijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, ChinaBeijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, ChinaBeijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, ChinaBeijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, ChinaBeijing Key Laboratory of Optoelectronic Functional Materials and Micro-nano Devices, School of Physics, Renmin University of China, Beijing 100872, ChinaDirect chemical vapor deposition (CVD) growth of hexagonal boron nitride (h-BN) on insulating substrates offers a promising pathway to circumvent transfer-induced defects and enhance device integration. This comprehensive review systematically evaluates recent advances in CVD techniques for h-BN synthesis on insulating substrates, including metal–organic CVD (MOCVD), low-pressure CVD (LPCVD), atmospheric-pressure CVD (APCVD), and plasma-enhanced CVD (PECVD). Key challenges, including precursor selection, high-temperature processing, achieving single-crystalline films, and maintaining phase purity, are critically analyzed. Special emphasis is placed on comparative performance metrics across different growth methodologies. Furthermore, crucial research directions for future development in this field are outlined. This review aims to serve as a reference for advancing h-BN synthesis toward practical applications in next-generation electronic and optoelectronic devices.https://www.mdpi.com/2079-4991/15/14/1059h-BNCVDinsulating substratesdirect growth2D materials |
| spellingShingle | Hua Xu Kai Li Zuoquan Tan Jiaqi Jia Le Wang Shanshan Chen Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates Nanomaterials h-BN CVD insulating substrates direct growth 2D materials |
| title | Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates |
| title_full | Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates |
| title_fullStr | Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates |
| title_full_unstemmed | Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates |
| title_short | Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates |
| title_sort | recent advances in chemical vapor deposition of hexagonal boron nitride on insulating substrates |
| topic | h-BN CVD insulating substrates direct growth 2D materials |
| url | https://www.mdpi.com/2079-4991/15/14/1059 |
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