Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates

Recent Advances in Chemical Vapor Deposition of Hexagonal Boron Nitride on Insulating Substrates

Direct chemical vapor deposition (CVD) growth of hexagonal boron nitride (h-BN) on insulating substrates offers a promising pathway to circumvent transfer-induced defects and enhance device integration. This comprehensive review systematically evaluates recent advances in CVD techniques for h-BN syn...

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Bibliographic Details
Main Authors: Hua Xu, Kai Li, Zuoquan Tan, Jiaqi Jia, Le Wang, Shanshan Chen
Format: Article
Language:English
Published: MDPI AG 2025-07-01
Series:Nanomaterials
Subjects:
h-BN
CVD
insulating substrates
direct growth
2D materials
Online Access:https://www.mdpi.com/2079-4991/15/14/1059
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