Deep Learning Hybrid Architecture Based on Vision Transformer for Phase Analysis of Moiré Fringes
Overlay accuracy is a fundamental indicator of a photolithography machine performance. Misalignment between the mask and wafer is the main factor affecting overlay accuracy. The photolithographic alignment method, which uses Moiré fringes, is notable for its straightforward optical path a...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10970258/ |
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