Deep Learning Hybrid Architecture Based on Vision Transformer for Phase Analysis of Moiré Fringes

Deep Learning Hybrid Architecture Based on Vision Transformer for Phase Analysis of Moiré Fringes

Overlay accuracy is a fundamental indicator of a photolithography machine performance. Misalignment between the mask and wafer is the main factor affecting overlay accuracy. The photolithographic alignment method, which uses Moiré fringes, is notable for its straightforward optical path a...

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Bibliographic Details
Main Authors: Dajie Yu, Junbo Liu, Chuan Jin, Yuyang Li, Kairui Zhang, Ji Zhou
Format: Article
Language:English
Published: IEEE 2025-01-01
Series:IEEE Photonics Journal
Subjects:
Deep learning
hybrid architecture
phase analysis
Moiré fringes
Online Access:https://ieeexplore.ieee.org/document/10970258/
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https://ieeexplore.ieee.org/document/10970258/

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