Study of a-Si/Al thickness on aluminum-induced crystallization

In this work, the effect of the a-Si/Al ratio on the poly-Si obtained as a result of aluminium-induced crystallization (AIC) of amorphous silicon a-Si at an annealing temperature of 490 °C has been studied. The dendritic shape of the resulting crystal structures suggests a growth model described by...

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Main Author: Merkulova Irina
Format: Article
Language:English
Published: EDP Sciences 2024-01-01
Series:E3S Web of Conferences
Online Access:https://www.e3s-conferences.org/articles/e3sconf/pdf/2024/108/e3sconf_sts2024_01020.pdf
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author Merkulova Irina
author_facet Merkulova Irina
author_sort Merkulova Irina
collection DOAJ
description In this work, the effect of the a-Si/Al ratio on the poly-Si obtained as a result of aluminium-induced crystallization (AIC) of amorphous silicon a-Si at an annealing temperature of 490 °C has been studied. The dendritic shape of the resulting crystal structures suggests a growth model described by diffusion-limited aggregation. The degree of coverage is slightly dependent on the initial ratio of amorphous silicon to aluminium and ranges from 15% to 25%. This is probably explained by the higher rate of secondary crystallization in the upper layer compared to the lower layer. The maximum average crystallite size is reached at a ratio of 0.9 and is 2.7 µm.
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spelling doaj-art-4a888a04eb80457aa3edbc98760c6f8a2025-08-20T02:10:42ZengEDP SciencesE3S Web of Conferences2267-12422024-01-015780102010.1051/e3sconf/202457801020e3sconf_sts2024_01020Study of a-Si/Al thickness on aluminum-induced crystallizationMerkulova Irina0Kutateladze Institute of Thermophysics SB RASIn this work, the effect of the a-Si/Al ratio on the poly-Si obtained as a result of aluminium-induced crystallization (AIC) of amorphous silicon a-Si at an annealing temperature of 490 °C has been studied. The dendritic shape of the resulting crystal structures suggests a growth model described by diffusion-limited aggregation. The degree of coverage is slightly dependent on the initial ratio of amorphous silicon to aluminium and ranges from 15% to 25%. This is probably explained by the higher rate of secondary crystallization in the upper layer compared to the lower layer. The maximum average crystallite size is reached at a ratio of 0.9 and is 2.7 µm.https://www.e3s-conferences.org/articles/e3sconf/pdf/2024/108/e3sconf_sts2024_01020.pdf
spellingShingle Merkulova Irina
Study of a-Si/Al thickness on aluminum-induced crystallization
E3S Web of Conferences
title Study of a-Si/Al thickness on aluminum-induced crystallization
title_full Study of a-Si/Al thickness on aluminum-induced crystallization
title_fullStr Study of a-Si/Al thickness on aluminum-induced crystallization
title_full_unstemmed Study of a-Si/Al thickness on aluminum-induced crystallization
title_short Study of a-Si/Al thickness on aluminum-induced crystallization
title_sort study of a si al thickness on aluminum induced crystallization
url https://www.e3s-conferences.org/articles/e3sconf/pdf/2024/108/e3sconf_sts2024_01020.pdf
work_keys_str_mv AT merkulovairina studyofasialthicknessonaluminuminducedcrystallization