In situ measurements of thermal and pressure dependent stress in SOG films by phase shifting interferometry
Hydrogen silsesquioxane (HSQ) and Medusa are spin-on-glasses used for several applications and more specifically for electron-beam lithography. To characterize the thermal densification of these resists on silicon, the mean resist film stress was measured in situ as function of temperature up to 600...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-12-01
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| Series: | Micro and Nano Engineering |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2590007224000558 |
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