Dynamic photomask directed lithography based on electrically stimulated nematic liquid crystal architectures
Abstract Lithography technology is a powerful tool for preparing complex microstructures through projecting patterns from static templates with permanent features onto samples. To simplify fabrication and alignment processes, dynamic photomask for multiple configurations preparation becomes increasi...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2024-10-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-024-53530-9 |
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