Evaluation of electron/ion sources effect and number of shots on Fe-Ta thin films using plasma focus device
Abstract The primary objective of this study was to employ the plasma focus (PF) technique to synthesize iron-tantalum (Fe-Ta) thin films while mitigating the reduction of iron content. The investigation focused on two variable parameters: the number of plasma shots and the type of irradiation sourc...
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
SpringerOpen
2025-08-01
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| Series: | Journal of Materials Science: Materials in Engineering |
| Subjects: | |
| Online Access: | https://doi.org/10.1186/s40712-025-00329-1 |
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