Detecting Important Features and Predicting Yield from Defects Detected by SEM in Semiconductor Production

Detecting Important Features and Predicting Yield from Defects Detected by SEM in Semiconductor Production

A key step to optimize the tests of semiconductors during the production process is to improve the prediction of the final yield from the defects detected on the wafers during the production process. This study investigates the link between the defects detected by a Scanning Electron Microscope (SEM...

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Bibliographic Details
Main Authors: Umberto Amato, Anestis Antoniadis, Italia De Feis, Anastasiia Doinychko, Irène Gijbels, Antonino La Magna, Daniele Pagano, Francesco Piccinini, Easter Selvan Suviseshamuthu, Carlo Severgnini, Andres Torres, Patrizia Vasquez
Format: Article
Language:English
Published: MDPI AG 2025-07-01
Series:Sensors
Subjects:
semiconductors
yield
Scanning Electron Microscope
predictive maintenance
Gradient Boosting
Odds Ratio
Online Access:https://www.mdpi.com/1424-8220/25/13/4218
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