Acoustic resonant imaging technique for characterization ofphotoresist properties depending on hard bake temperature
Photoresists are essential materials in semiconductor fabrication, specifically in lithography, where their physical and chemical properties influence pattern generation. However, their light-reactive make property measurements challenging. We investigated the effects of hard bake conditions o...
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| Main Authors: | , |
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| Format: | Article |
| Language: | deu |
| Published: |
NDT.net
2025-03-01
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| Series: | e-Journal of Nondestructive Testing |
| Online Access: | https://www.ndt.net/search/docs.php3?id=30813 |
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