Study on the performance of InGaN-based micro-LED by plasma etching combined with ion implantation process
This study utilized blue-light epitaxial wafers and employed semiconductor processes such as maskless laser writing, dry etching, wet etching, passivation layer deposition, electron beam evaporation, and ion implantation to fabricate micro-light emitting diode (μLED) arrays with different pixel size...
Saved in:
| Main Authors: | , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-01-01
|
| Series: | Next Nanotechnology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2949829524000627 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|