D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films
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| Main Author: | |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
1980-01-01
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| Series: | Active and Passive Electronic Components |
| Online Access: | http://dx.doi.org/10.1155/APEC.7.19 |
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| _version_ | 1832550269166026752 |
|---|---|
| author | Anant G. Sabnis |
| author_facet | Anant G. Sabnis |
| author_sort | Anant G. Sabnis |
| collection | DOAJ |
| format | Article |
| id | doaj-art-4118a51701bb406f90d494352e701fe5 |
| institution | Kabale University |
| issn | 0882-7516 1563-5031 |
| language | English |
| publishDate | 1980-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Active and Passive Electronic Components |
| spelling | doaj-art-4118a51701bb406f90d494352e701fe52025-02-03T06:07:15ZengWileyActive and Passive Electronic Components0882-75161563-50311980-01-0171-3192210.1155/APEC.7.19D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-FilmsAnant G. Sabnishttp://dx.doi.org/10.1155/APEC.7.19 |
| spellingShingle | Anant G. Sabnis D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films Active and Passive Electronic Components |
| title | D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films |
| title_full | D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films |
| title_fullStr | D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films |
| title_full_unstemmed | D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films |
| title_short | D.C. Sputtering Process: Its Characterization and its Problems When Applied to Tin-Dioxide Thin-Films |
| title_sort | d c sputtering process its characterization and its problems when applied to tin dioxide thin films |
| url | http://dx.doi.org/10.1155/APEC.7.19 |
| work_keys_str_mv | AT anantgsabnis dcsputteringprocessitscharacterizationanditsproblemswhenappliedtotindioxidethinfilms |