A Dual-Servo Stage With 6 D.O.F. Magnetically Levitated Fine Stage
A novel dual-servo stage using the magnetic levitation technology for semiconductor lithography to achieve high-precision and high-acceleration simultaneously is shown in this paper. The dual-servo is one of the methods to realize high-precision with a large stroke. The proposed fine stage magnetica...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10964296/ |
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