Prediction of Wafer Performance: Use of Functional Outlier Detection and Regression
Optical emission spectroscopy (OES) data is essential for virtual metrology, enabling accurate predictions of wafer performance in plasma etching processes. This approach not only reduces the need for physical measurements of product quality, leading to significant resource savings, but also support...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10898005/ |
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