Dynamic Characterization of III-Nitride-Based High-Speed Photodiodes
The objective of this study is to study, design, and develop a high-speed PIN photodiode based on In<sub>x</sub>Ga <sub>1-x</sub>N/GaN alloys deposited by metal–organic chemical vapor deposition. The configuration used for the PIN photodiode is based on...
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| Main Authors: | , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2017-01-01
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| Series: | IEEE Photonics Journal |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/7945255/ |
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| Summary: | The objective of this study is to study, design, and develop a high-speed PIN photodiode based on In<sub>x</sub>Ga <sub>1-x</sub>N/GaN alloys deposited by metal–organic chemical vapor deposition. The configuration used for the PIN photodiode is based on an absorbing layer composed of In<sub>0.1</sub>Ga<sub>0.9</sub>N multiple quantum wells. Structural, microstructural, and optical analyses have been carried out using TEM, PL, and absorption measurement. The design of PIN structures varies with an active surface ranging from <inline-formula> <tex-math notation="LaTeX">$10^{4}\,{\rm{to\,10}}^{6}\,{\rm{\mu m}}^{2}$</tex-math></inline-formula>. Static and dynamic characterizations have been performed to qualify the photodiode response. A photocurrent value reaching a maximum of 1.2 mA is reported for a diode of <inline-formula><tex-math notation="LaTeX">${\rm{100\times 100\,\mathrm{\mu} m}}^{2}$</tex-math></inline-formula> area, with an external quantum efficiency of 13%. Using the noise measurement technique, the device reveals a −3-dB cutoff frequency of 300 MHz for the same photodiode. This result clearly shows the potential of III-nitride materials for targeting high-speed optoelectronics. The future prospect is to work toward InGaN-based microphotodiodes in order to achieve optical transmission links in the UV-visible range using the same material system. |
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| ISSN: | 1943-0655 |