Defect detection in photolithographic patterns using deep learning models trained on synthetic data
In the photolithographic process vital to semiconductor manufacturing, various types of defects appear during EUV pattering. Due to ever-shrinking pattern size, these defects are extremely small and cause false or missed detection during inspection. Specifically, the lack of defect-annotated quality...
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| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-05-01
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| Series: | Heliyon |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S240584402501761X |
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