A study of superconducting behavior in ruthenium thin films
Ruthenium (Ru) is a promising candidate for next-generation electronic interconnects due to its low resistivity, small mean free path, and superior electromigration reliability at nanometer scales. In addition, Ru exhibits superconductivity below 1 K, with resistance to oxidation, low diffusivity, a...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-06-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/5.0271150 |
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