SnO Nanosheet Transistor with Remarkably High Hole Effective Mobility and More than Six Orders of Magnitude On-Current/Off-Current
Using novel SiO<sub>2</sub> surface passivation and ultraviolet (UV) light anneal, a 12 nm thick SnO p-type FET (pFET) shows hole effective mobilities (µ<sub>eff</sub>) of more than 100 cm<sup>2</sup>/V·s and 31.1 cm<sup>2</sup>/V·s at hole densities (...
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| Main Authors: | Kuan-Chieh Chen, Jiancheng Wu, Pheiroijam Pooja, Albert Chin |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-04-01
|
| Series: | Nanomaterials |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2079-4991/15/9/640 |
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