Enhancement in Performance and Reliability of Fully Transparent a-IGZO Top-Gate Thin-Film Transistors by a Two-Step Annealing Treatment

A two-step annealing treatment was applied on a fully transparent amorphous InGaZnO4 (a-IGZO) top-gate thin-film transistor (TG-TFT) to improve the device performance. The electrical properties and stabilities of a-IGZO TG TFTs were significantly improved as the first-annealing temperature increased...

Full description

Saved in:
Bibliographic Details
Main Authors: Shuaiying Zheng, Chengyuan Wang, Shaocong Lv, Liwei Dong, Zhijun Li, Qian Xin, Aimin Song, Jiawei Zhang, Yuxiang Li
Format: Article
Language:English
Published: MDPI AG 2025-03-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/15/6/460
Tags: Add Tag
No Tags, Be the first to tag this record!