High-voltage kV-class AlN metal-semiconductor field-effect transistors on single-crystal AlN substrates
This letter reports the demonstration and electrical characterization of high-voltage AlN metal-semiconductor field-effect transistors (MESFETs) on single-crystal AlN substrates. Compared with AlN MESFETs on foreign substrates, the AlN-on-AlN MESFETs showed high breakdown voltages of over 2 kV for d...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IOP Publishing
2024-01-01
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| Series: | Applied Physics Express |
| Subjects: | |
| Online Access: | https://doi.org/10.35848/1882-0786/ad85c0 |
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| Summary: | This letter reports the demonstration and electrical characterization of high-voltage AlN metal-semiconductor field-effect transistors (MESFETs) on single-crystal AlN substrates. Compared with AlN MESFETs on foreign substrates, the AlN-on-AlN MESFETs showed high breakdown voltages of over 2 kV for drain-to-gate spacing of 15 μm and one of the highest average breakdown fields among reported AlN MESFETs. Additionally, the devices also exhibited decent drain saturation current and on/off ratio without complicated regrown or graded contact layers, which are several times higher than those of reported AlN-on-sapphire MESEFTs. This work is beneficial for the future development of ultrawide bandgap AlN power electronics. |
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| ISSN: | 1882-0786 |