Transfer of photolithographic patterns by excimer laser ablation of polymers
Pattern transfer of lithographically produced patterns is a key technology in microelectronics and other micro- and nanotechnologies. This approach has been perfected continuously to meet the requirements for size and quality, but vacuum processes are required for pattern transfer into microelectron...
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| Main Authors: | Klaus Zimmer, Joachim Zajadacz, Martin Ehrhardt, Pierre Lorenz, Tamás Smausz, Béla Hopp |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-06-01
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| Series: | Applied Surface Science Advances |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2666523925000625 |
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