Transfer of photolithographic patterns by excimer laser ablation of polymers

Pattern transfer of lithographically produced patterns is a key technology in microelectronics and other micro- and nanotechnologies. This approach has been perfected continuously to meet the requirements for size and quality, but vacuum processes are required for pattern transfer into microelectron...

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Bibliographic Details
Main Authors: Klaus Zimmer, Joachim Zajadacz, Martin Ehrhardt, Pierre Lorenz, Tamás Smausz, Béla Hopp
Format: Article
Language:English
Published: Elsevier 2025-06-01
Series:Applied Surface Science Advances
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Online Access:http://www.sciencedirect.com/science/article/pii/S2666523925000625
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