APA (7th ed.) Citation

Mao, Q., Zhu, J., Cheng, X., & Wang, Z. Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution. Springer.

Chicago Style (17th ed.) Citation

Mao, Qingyuan, Jingyuan Zhu, Xinbin Cheng, and Zhanshan Wang. Proximity Effect Correction in Electron Beam Lithography Using a Composite Function Model of Electron Scattering Energy Distribution. Springer.

MLA (9th ed.) Citation

Mao, Qingyuan, et al. Proximity Effect Correction in Electron Beam Lithography Using a Composite Function Model of Electron Scattering Energy Distribution. Springer.