Arsenic-free Ge-Te-based ovonic threshold switching material with reduced leakage current

Abstract There is growing interest in next-generation semiconductor memory that combines high speed, large capacity, and non-volatility. Many types of emerging memory technologies, such as PCRAM and MRAM, are being developed utilizing 3D crossbar array structures to achieve high integration. In this...

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Bibliographic Details
Main Authors: Yoshimasa Matsushita, Yi Shuang, Kosuke Karakida, Eisuke Takao, Naoki Toyofuku, Fumio Sato, Ken Choju, Yuji Sutou
Format: Article
Language:English
Published: Nature Portfolio 2025-07-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-025-01323-5
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