APA (7th ed.) Citation

Li, J., & Li, H. Impact of chemical stochastics in extreme ultraviolet photoresists on the pattern quality. AIP Publishing LLC.

Chicago Style (17th ed.) Citation

Li, Jianing, and Haoyuan Li. Impact of Chemical Stochastics in Extreme Ultraviolet Photoresists on the Pattern Quality. AIP Publishing LLC.

MLA (9th ed.) Citation

Li, Jianing, and Haoyuan Li. Impact of Chemical Stochastics in Extreme Ultraviolet Photoresists on the Pattern Quality. AIP Publishing LLC.

Warning: These citations may not always be 100% accurate.