Impact of chemical stochastics in extreme ultraviolet photoresists on the pattern quality
Stochastic issues have been recognized as a major limiting factor in improving the pattern quality in extreme ultraviolet (EUV) lithography. These stochastic factors include photon shot noise (PSN) and chemical noise within the photoresist. While the impact of the former has been relatively well-est...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-03-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0259320 |
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