Influence of the Carrier Gas Flow in the CVD Synthesis of 2-Dimensional MoS<sub>2</sub> Based on the Spin-Coating of Liquid Molybdenum Precursors

Influence of the Carrier Gas Flow in the CVD Synthesis of 2-Dimensional MoS<sub>2</sub> Based on the Spin-Coating of Liquid Molybdenum Precursors

Atomically thin molybdenum disulfide (MoS<sub>2</sub>) is a two-dimensional semiconductor with versatile applications. The recent adoption of liquid molybdenum precursors in chemical vapor deposition has contributed significantly to the reproducible wafer-scale synthesis of MoS<sub>...

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Bibliographic Details
Main Authors: Fiorenza Esposito, Matteo Bosi, Giovanni Attolini, Francesca Rossi, Roberto Fornari, Filippo Fabbri, Luca Seravalli
Format: Article
Language:English
Published: MDPI AG 2024-10-01
Series:Nanomaterials
Subjects:
molybdenum disulfide
liquid molybdenum precursors
chemical vapor deposition
carrier gas
Raman spectroscopy
photoluminescence spectroscopy
Online Access:https://www.mdpi.com/2079-4991/14/21/1749
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