Development of blue-light GaN based micro light-emitting diodes using ion implantation technology

Abstract This study fabricated 10 μm chip size μLEDs of blue-light GaN based epilayers structure with different mesa processes using dry etching and ion implantation technology. Two ion sources, As and Ar, were applied to implant into the LED structure to achieve material isolation and avoid defects...

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Bibliographic Details
Main Authors: Yu-Hsuan Hsu, Shao-Hua Lin, Dong-Sing Wuu, Ray-Hua Horng
Format: Article
Language:English
Published: Springer 2024-12-01
Series:Discover Nano
Subjects:
Online Access:https://doi.org/10.1186/s11671-024-04169-4
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