A progressive wafer scale approach for Sub-10 nm nanogap structures
Abstract Sub-10 nm nanostructures with high precision and uniformity are of significant interest due to their unique quantum properties and critical role in next-generation devices. However, current fabrication techniques are often constrained by the slow, small-area processes of electron beam litho...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2025-04-01
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| Series: | Scientific Reports |
| Online Access: | https://doi.org/10.1038/s41598-025-96200-6 |
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