Global alignment reference strategy for laser interference lithography pattern arrays
Abstract Large-area gratings play a crucial role in various engineering fields. However, traditional interference lithography is limited by the size of optical component apertures, making large-area fabrication a challenging task. Here, a method for fabricating laser interference lithography pattern...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group
2025-03-01
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| Series: | Microsystems & Nanoengineering |
| Online Access: | https://doi.org/10.1038/s41378-025-00889-4 |
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