Thin Metal Superlens Imaging in Nanolithography

Superlens imaging system in nanolithography can be regarded as a cascade of two F-P cavities, i.e., a superlens cavity and a dielectric cavity between superlens and introduced mask of high loss, and the transfer function of system is obtained by considering multiple reflections inside the two caviti...

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Main Authors: Jing Wang, Yunlong Sheng
Format: Article
Language:English
Published: Wiley 2019-01-01
Series:International Journal of Optics
Online Access:http://dx.doi.org/10.1155/2019/6513836
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author Jing Wang
Yunlong Sheng
author_facet Jing Wang
Yunlong Sheng
author_sort Jing Wang
collection DOAJ
description Superlens imaging system in nanolithography can be regarded as a cascade of two F-P cavities, i.e., a superlens cavity and a dielectric cavity between superlens and introduced mask of high loss, and the transfer function of system is obtained by considering multiple reflections inside the two cavities. For the range of wavevector of interest, the typical high peak of transmission coefficient of superlens coincides with a local minimum of transmission coefficient of dielectric cavity. The peak of transfer function of system corresponds to the peak of transmission coefficient of dielectric cavity. Thin superlens imaging system in nanolithography is analyzed based on transfer function, which can be flattened by simply tuning transmission coefficient of dielectric cavity and superlens cavity. The results are further validated by Finite Element Method (FEM) simulations.
format Article
id doaj-art-045fb186ead042d797b1147c8401a002
institution OA Journals
issn 1687-9384
1687-9392
language English
publishDate 2019-01-01
publisher Wiley
record_format Article
series International Journal of Optics
spelling doaj-art-045fb186ead042d797b1147c8401a0022025-08-20T02:03:08ZengWileyInternational Journal of Optics1687-93841687-93922019-01-01201910.1155/2019/65138366513836Thin Metal Superlens Imaging in NanolithographyJing Wang0Yunlong Sheng1Département de Physique, de Génie Physique et d'Optique; Centre d'Optique, Photonique et Laser (COPL), Université Laval, Québec, G1V 0A6, CanadaDépartement de Physique, de Génie Physique et d'Optique; Centre d'Optique, Photonique et Laser (COPL), Université Laval, Québec, G1V 0A6, CanadaSuperlens imaging system in nanolithography can be regarded as a cascade of two F-P cavities, i.e., a superlens cavity and a dielectric cavity between superlens and introduced mask of high loss, and the transfer function of system is obtained by considering multiple reflections inside the two cavities. For the range of wavevector of interest, the typical high peak of transmission coefficient of superlens coincides with a local minimum of transmission coefficient of dielectric cavity. The peak of transfer function of system corresponds to the peak of transmission coefficient of dielectric cavity. Thin superlens imaging system in nanolithography is analyzed based on transfer function, which can be flattened by simply tuning transmission coefficient of dielectric cavity and superlens cavity. The results are further validated by Finite Element Method (FEM) simulations.http://dx.doi.org/10.1155/2019/6513836
spellingShingle Jing Wang
Yunlong Sheng
Thin Metal Superlens Imaging in Nanolithography
International Journal of Optics
title Thin Metal Superlens Imaging in Nanolithography
title_full Thin Metal Superlens Imaging in Nanolithography
title_fullStr Thin Metal Superlens Imaging in Nanolithography
title_full_unstemmed Thin Metal Superlens Imaging in Nanolithography
title_short Thin Metal Superlens Imaging in Nanolithography
title_sort thin metal superlens imaging in nanolithography
url http://dx.doi.org/10.1155/2019/6513836
work_keys_str_mv AT jingwang thinmetalsuperlensimaginginnanolithography
AT yunlongsheng thinmetalsuperlensimaginginnanolithography