Thin Metal Superlens Imaging in Nanolithography
Superlens imaging system in nanolithography can be regarded as a cascade of two F-P cavities, i.e., a superlens cavity and a dielectric cavity between superlens and introduced mask of high loss, and the transfer function of system is obtained by considering multiple reflections inside the two caviti...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
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Wiley
2019-01-01
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| Series: | International Journal of Optics |
| Online Access: | http://dx.doi.org/10.1155/2019/6513836 |
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| _version_ | 1850232551361216512 |
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| author | Jing Wang Yunlong Sheng |
| author_facet | Jing Wang Yunlong Sheng |
| author_sort | Jing Wang |
| collection | DOAJ |
| description | Superlens imaging system in nanolithography can be regarded as a cascade of two F-P cavities, i.e., a superlens cavity and a dielectric cavity between superlens and introduced mask of high loss, and the transfer function of system is obtained by considering multiple reflections inside the two cavities. For the range of wavevector of interest, the typical high peak of transmission coefficient of superlens coincides with a local minimum of transmission coefficient of dielectric cavity. The peak of transfer function of system corresponds to the peak of transmission coefficient of dielectric cavity. Thin superlens imaging system in nanolithography is analyzed based on transfer function, which can be flattened by simply tuning transmission coefficient of dielectric cavity and superlens cavity. The results are further validated by Finite Element Method (FEM) simulations. |
| format | Article |
| id | doaj-art-045fb186ead042d797b1147c8401a002 |
| institution | OA Journals |
| issn | 1687-9384 1687-9392 |
| language | English |
| publishDate | 2019-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | International Journal of Optics |
| spelling | doaj-art-045fb186ead042d797b1147c8401a0022025-08-20T02:03:08ZengWileyInternational Journal of Optics1687-93841687-93922019-01-01201910.1155/2019/65138366513836Thin Metal Superlens Imaging in NanolithographyJing Wang0Yunlong Sheng1Département de Physique, de Génie Physique et d'Optique; Centre d'Optique, Photonique et Laser (COPL), Université Laval, Québec, G1V 0A6, CanadaDépartement de Physique, de Génie Physique et d'Optique; Centre d'Optique, Photonique et Laser (COPL), Université Laval, Québec, G1V 0A6, CanadaSuperlens imaging system in nanolithography can be regarded as a cascade of two F-P cavities, i.e., a superlens cavity and a dielectric cavity between superlens and introduced mask of high loss, and the transfer function of system is obtained by considering multiple reflections inside the two cavities. For the range of wavevector of interest, the typical high peak of transmission coefficient of superlens coincides with a local minimum of transmission coefficient of dielectric cavity. The peak of transfer function of system corresponds to the peak of transmission coefficient of dielectric cavity. Thin superlens imaging system in nanolithography is analyzed based on transfer function, which can be flattened by simply tuning transmission coefficient of dielectric cavity and superlens cavity. The results are further validated by Finite Element Method (FEM) simulations.http://dx.doi.org/10.1155/2019/6513836 |
| spellingShingle | Jing Wang Yunlong Sheng Thin Metal Superlens Imaging in Nanolithography International Journal of Optics |
| title | Thin Metal Superlens Imaging in Nanolithography |
| title_full | Thin Metal Superlens Imaging in Nanolithography |
| title_fullStr | Thin Metal Superlens Imaging in Nanolithography |
| title_full_unstemmed | Thin Metal Superlens Imaging in Nanolithography |
| title_short | Thin Metal Superlens Imaging in Nanolithography |
| title_sort | thin metal superlens imaging in nanolithography |
| url | http://dx.doi.org/10.1155/2019/6513836 |
| work_keys_str_mv | AT jingwang thinmetalsuperlensimaginginnanolithography AT yunlongsheng thinmetalsuperlensimaginginnanolithography |