Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy
When fabricating magnetic components for micro-electro-mechanical systems, the intrinsic material properties as well as the magnetic anisotropy of the deposited material and the fabricated devices must be adjusted to the application. This work focuses on electrochemically deposited cobalt phosphorus...
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Elsevier
2024-11-01
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| Series: | Journal of Materials Research and Technology |
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| Online Access: | http://www.sciencedirect.com/science/article/pii/S2238785424021495 |
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| author | Felix Wetzler Jan-Erik Nebel Wei Zhang Sven Urschel Peter Starke Monika Saumer |
| author_facet | Felix Wetzler Jan-Erik Nebel Wei Zhang Sven Urschel Peter Starke Monika Saumer |
| author_sort | Felix Wetzler |
| collection | DOAJ |
| description | When fabricating magnetic components for micro-electro-mechanical systems, the intrinsic material properties as well as the magnetic anisotropy of the deposited material and the fabricated devices must be adjusted to the application. This work focuses on electrochemically deposited cobalt phosphorus layers from a sulfate-based electrolyte to be used as hard magnetic scales in position measurement systems. In preliminary tests round discs (5 mm diameter, 20 or 10 μm height) were fabricated, showing the influence of three process parameters (current density, pH-value and temperature) on the chemical composition and the magnetic behavior of the deposited cobalt phosphorus. Hereby deposition parameters to produce hard magnetic cobalt phosphorus are defined. Deposits with up to 6 wt.-% phosphorus show hard magnetic behavior, whereas deposits with more than 6 wt.-% show soft magnetic behavior. This is correlated with a transition from crystalline to amorphous structures. In further investigations arrays of micro scales (40 μm width, 10 μm height) were fabricated to show the influence of direct current and pulsed current on the properties of the deposits. Pulsed current increases coercive field strength by about 40 %, resulting in maximum values of 23 kA/m (in-plane) and 14 kA/m (out-of-plane). Remanence increases by about 30 %, resulting in maximum values of 0.40 T (in-plane) and 0.2 T (out-of-plane). Pulse plating changes preferred orientation from (110) to (100) and slightly increases grain size by about 20 %, resulting in an average grain size of 25 nm. |
| format | Article |
| id | doaj-art-00e085057fad45deaa5ef5371fe9c0ed |
| institution | OA Journals |
| issn | 2238-7854 |
| language | English |
| publishDate | 2024-11-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Journal of Materials Research and Technology |
| spelling | doaj-art-00e085057fad45deaa5ef5371fe9c0ed2025-08-20T02:35:33ZengElsevierJournal of Materials Research and Technology2238-78542024-11-01332081209210.1016/j.jmrt.2024.09.144Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropyFelix Wetzler0Jan-Erik Nebel1Wei Zhang2Sven Urschel3Peter Starke4Monika Saumer5Department of Microsystems and Information Technologies, University of Applied Sciences Kaiserslautern, Amerikastr. 1, D-66482, Zweibrücken, GermanyDepartment of Materials Science and Materials Testing, University of Applied Sciences Kaiserslautern, Schoenstr. 11, D-67659, Kaiserslautern, GermanyDepartment of Electrotechnical Systems of Mechatronics, University of Applied Sciences Kaiserslautern, Schoenstr. 11, D-67659, Kaiserslautern, GermanyDepartment of Electrotechnical Systems of Mechatronics, University of Applied Sciences Kaiserslautern, Schoenstr. 11, D-67659, Kaiserslautern, GermanyDepartment of Materials Science and Materials Testing, University of Applied Sciences Kaiserslautern, Schoenstr. 11, D-67659, Kaiserslautern, GermanyDepartment of Microsystems and Information Technologies, University of Applied Sciences Kaiserslautern, Amerikastr. 1, D-66482, Zweibrücken, Germany; Corresponding author.When fabricating magnetic components for micro-electro-mechanical systems, the intrinsic material properties as well as the magnetic anisotropy of the deposited material and the fabricated devices must be adjusted to the application. This work focuses on electrochemically deposited cobalt phosphorus layers from a sulfate-based electrolyte to be used as hard magnetic scales in position measurement systems. In preliminary tests round discs (5 mm diameter, 20 or 10 μm height) were fabricated, showing the influence of three process parameters (current density, pH-value and temperature) on the chemical composition and the magnetic behavior of the deposited cobalt phosphorus. Hereby deposition parameters to produce hard magnetic cobalt phosphorus are defined. Deposits with up to 6 wt.-% phosphorus show hard magnetic behavior, whereas deposits with more than 6 wt.-% show soft magnetic behavior. This is correlated with a transition from crystalline to amorphous structures. In further investigations arrays of micro scales (40 μm width, 10 μm height) were fabricated to show the influence of direct current and pulsed current on the properties of the deposits. Pulsed current increases coercive field strength by about 40 %, resulting in maximum values of 23 kA/m (in-plane) and 14 kA/m (out-of-plane). Remanence increases by about 30 %, resulting in maximum values of 0.40 T (in-plane) and 0.2 T (out-of-plane). Pulse plating changes preferred orientation from (110) to (100) and slightly increases grain size by about 20 %, resulting in an average grain size of 25 nm.http://www.sciencedirect.com/science/article/pii/S2238785424021495Magnetic propertyProcess-material-property correlationMorphologyCrystal orientationGrain sizePulsed current |
| spellingShingle | Felix Wetzler Jan-Erik Nebel Wei Zhang Sven Urschel Peter Starke Monika Saumer Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy Journal of Materials Research and Technology Magnetic property Process-material-property correlation Morphology Crystal orientation Grain size Pulsed current |
| title | Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy |
| title_full | Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy |
| title_fullStr | Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy |
| title_full_unstemmed | Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy |
| title_short | Electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy |
| title_sort | electrochemical deposition of cobalt phosphorus for hard magnetic micro devices and the impact on magnetic anisotropy |
| topic | Magnetic property Process-material-property correlation Morphology Crystal orientation Grain size Pulsed current |
| url | http://www.sciencedirect.com/science/article/pii/S2238785424021495 |
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