Showing 1 - 20 results of 21 for search 'sputtering yield application', query time: 0.08s Refine Results
  1. 1

    Microstructural, textural evolution and mechanical properties of NiV7 alloy after severe cold rolling and annealing treatment for sputtering application by Linqing Yang, Hongyan Wang, Shiqi Li, Zhiqiang Yang, Han Xiao, Ming Wen

    Published 2025-07-01
    “…These findings demonstrate that appropriate annealing can effectively tailor the microstructure and mechanical properties of cold-rolled NiV7 alloy sheets, thereby optimizing their performance as sputtering targets. This study provides important guidance for the design and fabrication of high-performance nickel-vanadium sputtering targets for advanced thin film applications.…”
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  2. 2

    Comparison of Continuous and Pulsed Low-Power DC Sputtered Ti Thin Films Deposited at Room Temperature by Anna Maria Reider, Ariane Kronthaler, Fabio Zappa, Alexander Menzel, Felix Laimer, Paul Scheier

    Published 2025-05-01
    “…These results outline a path for low-power DC sputtering as a reliable approach for studying the evolution of functional properties in ultra-thin films and for the gentle fabrication of coatings where thermal stress must be avoided, making the method compatible with temperature-sensitive applications.…”
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  3. 3

    High photothermal conversion efficiency of RF sputtered Ti4O7 Magneli phase thin films and its linear correlation with light absorption capacity by L. Pichon, H. Rekik, H. Arab, P. Drogui, M. A. El Khakani

    Published 2024-12-01
    “…This is the highest ηext reported so far for sputtered-Ti4O7 coatings (just ~ 450 nm-thick), highlighting their significant potential for photothermal applications such as desalination, deicing and/or smart windows. …”
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  4. 4
  5. 5

    A Comprehensive Review of Plasma Cleaning Processes Used in Semiconductor Packaging by Stephen Sammut

    Published 2025-06-01
    “…Impurities such as oxides or organic matter on the surfaces have an impact on the process yield. Plasma cleaning is a vital process in semiconductor manufacturing, employed to enhance production yield through precise and efficient surface preparation essential for device fabrication. …”
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  6. 6

    DEPTH MEASUREMENT OF DISRUPTED LAYER ON SILICON WAFER SURFACE USING AUGER SPECTROSCOPY METHOD by V. A. Solodukha, A. I. Belous, G. G. Chyhir

    Published 2016-08-01
    “…The paper proposes a method for depth measurement of a disrupted layer on silicon wafer surface which is based on application of Auger spectroscopy with the precision sputtering of surface silicon layers and registration of the Auger electron yield intensity. …”
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  7. 7

    Influence of substrate bias on the properties of CrAlN wear-resistant coating prepared by arc/magnetron composite technology by Xiaoyan NIU, Mingze LIU, Guoqiang DONG, Yujiang WANG, Haoliang TIAN

    Published 2025-02-01
    “…In addition, substrate bias, a key process parameter, was found to affect particle activity and sputtering yield, thereby modulating element distribution in the coating and coating properties. …”
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  8. 8

    A review of recent advances in ZnO nanostructured thin films by various deposition techniques by Fatema Tuz Zohora Toma, Md Sharifur Rahman, Kazi Hanium Maria

    Published 2025-03-01
    “…The comparative analysis indicates key findings such as CBD and Spin Coating yield high optical transparency (85–92%) and intense band gaps (2.59–3.37 eV), making them ideal for gas-sensing and UV-blocking applications. …”
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  9. 9

    Modulation of Giant Magnetoimpedance Effect in Co-Based Amorphous Wires by Carbon-Based Nanocoatings by Zhen Yang, Jiabao Huang, Jingyuan Chen, Chong Lei

    Published 2025-04-01
    “…In contrast, the MS technique proved more effective in improving the GMI effect, yielding superior results. Co-AWs coated via Ms exhibited smoother surfaces and reduced coercivity. …”
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  10. 10

    Template‐Free Synthesis of Highly Porous Metal Nitride Architectures for Electronics and Molecular Sensing by Adrien Baut, Michael Pereira Martins, Andreas T. Güntner

    Published 2025-06-01
    “…This is associated to compact film architecture yielded by conventional deposition techniques (e.g., sputtering). …”
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  11. 11

    Realizing High Performance in Flexible Mg3Sb2−xBix Thin‐Film Thermoelectrics by Boxuan Hu, Xiao‐Lei Shi, Tianyi Cao, Min Zhang, Wenyi Chen, Siqi Liu, Meng Li, Weidi Liu, Zhi‐Gang Chen

    Published 2025-05-01
    “…This approach enhances the near‐room‐temperature performance and plasticity, yielding high‐performance Mg3Sb2−xBix thermoelectric thin films. …”
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  12. 12

    Effects of different electrodes used in bone-guided extracochlear implants on electrical stimulation of auditory nerves in guinea pigs by Chien-Hao Liu, Yung-Shan Lu, Po-Chun Chen, Chia-Fone Lee

    Published 2021-01-01
    “…Results: Based on electrical auditory brainstem responses, IrOxelectrodes yielded lower acoustic nerve-stimulating threshold currents (132 μA) compared with Au electrodes (204 μA). …”
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  13. 13

    Enhancing perpendicular magnetic anisotropy and magneto-optical signal of electron beam evaporated [Co/Pt]1 and [Co/Pt]2 thin films by D. Doménech, A. Villar, C. Redondo, N. A. Río-López, J. M. Porro, R. Morales

    Published 2025-06-01
    “…Nanostructured magnetic multilayers with perpendicular magnetic anisotropy (PMA) are interesting materials for a plethora of magneto-optical and spintronic applications. The search for PMA in these heterostructures is commonly pursued by employing magnetron sputtering under ultra-high vacuum conditions and stacking a large number of layer repetitions. …”
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  14. 14

    Effect of Deposition Conditions on Microstructure and Composition of Nitride Monolayer and Carbide-Nitride Multilayer Coatings Based on W and Nb by O.V. Maksakova, V.M. Beresnev, S.V. Lytovchenko, D.V. Horokh, B.O. Mazilin, I.O. Afanasieva, M. Čaplovičova, M. Sahul

    Published 2025-06-01
    “…Optimal structure was achieved at moderate bias (–120 V) and high W arc current, yielding uniform layers, balanced composition, and enhanced crystallinity. …”
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  15. 15

    Resistive switching behaviors and conduction mechanisms of IGZO/ZnO bilayer heterostructure memristors by Xiongfeng Wang, Zhenyi Guo, Weiying Zheng, Zhiquan Liu, Tengzhang Liu, Xiaopei Chen, Peimian Cai, Qiyan Zhang, Wugang Liao

    Published 2024-11-01
    “…Bilayer memristors with varying ZnO thicknesses were prepared using magnetron sputtering, and their electrical properties were evaluated. …”
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  16. 16

    Cr doping modification for tribological behavior of Cr/a-C multilayer coatings against PEEK under diverse operational conditions by Xiaohui Zhou, Yingpeng Zhang, Hao Li, Li Cui, Wei Yang, Aiying Wang, Peng Guo, Peiling Ke

    Published 2025-03-01
    “…Considering the increasing demand for wear-resistant materials used for various frictions with dynamic sealing parts, we employed hybrid magnetron sputtering technology to fabricate Cr/amorphous carbon (a-C) multilayered coatings with and without Cr doping for comparison. …”
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  17. 17

    Reliable Atom Probe Tomography of Cu Nanoparticles Through Tailored Encapsulation by an Electrodeposited Film by Aydan Çiçek, Florian Knabl, Maximilian Schiester, Helene Waldl, Lidija D. Rafailović, Michael Tkadletz, Christian Mitterer

    Published 2024-12-01
    “…Copper nanoparticles were deposited via magnetron sputter inert gas condensation with varying deposition times to yield suitable surface coverages, followed by encapsulation with the nickel film. …”
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  18. 18

    Self‐Aligned Heterojunction Gate Carbon Nanotube Phototransistors for Highly Sensitive Infrared Detection by Jingjing Ge, Xiaolu Xia, Maguang Zhu, Shaoyuan Zhou, Yifu Sun, Hangqi Ma, Xinyue Pei, Dijie Zhang, Ying Wang, Zhiyong Zhang

    Published 2025-07-01
    “…This study can be insightful in developing high‐performance, easily manufacturable CNT‐based infrared detectors and high‐resolution imaging applications.…”
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  19. 19

    Adhesion Energy for Nonideal Cantilever and Its Relation to Casimir–Lifshitz Forces by Ivan A. Soldatenkov, Vitaly B. Svetovoy

    Published 2024-10-01
    “…In this paper, a generalized formula is deduced that relates the parameters of a cantilever to the adhesion energy. The application of the formula is demonstrated using the first test result from the setup, where a silicon cantilever adhered to a substrate sputters with ruthenium. …”
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  20. 20

    Navigating high-dimensional process-structure–property relations in nanocrystalline Pt-Au alloys with machine learning by Saaketh Desai, Manish Jain, Sadhvikas J. Addamane, David P. Adams, Remi Dingreville, Frank W. DelRio, Brad L. Boyce

    Published 2024-12-01
    “…In this paper, we combined combinatorial sputter deposition and multi-modal high-throughput materials characterization with feedforward neural networks to establish high-dimensional process-structure–property relations in Pt-Au alloys, yielding nanocrystalline alloys with high hardness and low resistivity relevant to electrical contact switch applications. …”
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