Random Forest-Based Prediction of the Optimal Solid Ink Density in Offset Lithography by Laihu Peng, Hao Fan, Yubao Qi, Jianqiang Li

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Circuit modeling and hybrid optimization of a lithography-free visible metamaterial absorber by Shimaa I. Sayed, K. R. Mahmoud, Roaa I. Mubarak

“…Abstract This paper presents a lithography-free broadband metamaterial absorber designed to cover the visible wavelength spectrum. …”
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A Hierarchical Inverse Lithography Method Considering the Optimization and Manufacturability Limit by Gradient Descent by Haifeng Sun, Qingyan Zhang, Jie Zhou, Jianwen Gong, Chuan Jin, Ji Zhou, Junbo Liu

“…Inverse lithography technology (ILT) based on the gradient descent (GD) algorithm, which is a classical local optimal method, can effectively improve the lithographic imaging fidelity. …”
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Frequency-Decoupled Dual-Stage Inverse Lithography Optimization via Hierarchical Sampling and Morphological Enhancement by Jie Zhou, Qingyan Zhang, Haifeng Sun, Chuan Jin, Ji Zhou, Junbo Liu

Subjects: “…computational lithography…”
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Optimization Design Method of a 6-DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens by Shiyu Li, Junbo Liu, Ji Zhou, Haifeng Sun, Chuan Jin, Xia Kang, Song Hu

“…The six-degree-of-freedom (6-DOF) micromotion mechanism is a key component in extreme ultraviolet (EUV) projection lithography objectives to compensate for wavefront aberration and ensure performance stability. …”
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Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques by Maha Labani, Vito Clericò, Enrique Diez, Giancarlo Gatti, Mario Amado, Ana Pérez-Rodríguez

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Rapid Prototyping of a Dammann Grating in DMD-Based Maskless Lithography by Qi Zheng, Jinyun Zhou, Qiming Chen, Liang Lei, Kunhua Wen, Yiming Hu

“…Using a series of experiments and optimized designs, we analyze the characteristics of the photocurable resin, quantify the dose modulation for lithography and redesign the mask pattern. …”
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Advancements and challenges in inverse lithography technology: a review of artificial intelligence-based approaches by Yixin Yang, Kexuan Liu, Yunhui Gao, Chen Wang, Liangcai Cao

“…Abstract Inverse lithography technology (ILT) is a promising approach in computational lithography to address the challenges posed by shrinking semiconductor device dimensions. …”
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In Situ Control of Reactive Mesogens Alignment During 3D Printing by Two‐Photon Lithography by Tiziana Ritacco, Alfredo Mazzulla, Michele Giocondo, Gabriella Cipparrone, Pasquale Pagliusi

“…Herein, the deterministic effect of TPL on the orientation of mesogenic moieties is reported, under optimized printing conditions. Specifically, a single‐step simple method is developed for aligning the nematic director in situ, with sub‐diffraction‐limited resolution, during 3D printing. …”
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Effects of Electron Beam Lithography Process Parameters on the Structure of Nanoscale Devices Across Three Substrate Materials by Zhongyang Liu, Yue Chen, Xuanyu Li, Luwei Wang, Junle Qu

“…Electron beam lithography (EBL) is a pivotal technology in the fabrication of nanoscale devices, renowned for its high precision and resolution capabilities. …”
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Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types by Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Taeho Lee, Yasin Ekinci, Jinho Ahn

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Rapid prototyping of 3D microstructures: A simplified grayscale lithography encoding method using blender by Fabrício Frizera Borghi, Mohammed Bendimerad, Marie-Ly Chapon, Tatiana Petithory, Laurent Vonna, Laurent Pieuchot

“…This work presents a simplified method for encoding 3D objects into grayscale image files optimized for grayscale lithography. Leveraging the widely used and open-source 3D modeling software Blender, we developed a robust approach to convert geometric heights into grayscale levels and generate image files through top-view rendering. …”
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Proximity effect correction in electron beam lithography using a composite function model of electron scattering energy distribution by Qingyuan Mao, Jingyuan Zhu, Xinbin Cheng, Zhanshan Wang

“…Moreover, this model not only optimizes the computational efficiency of PSF calculations but also demonstrates greater potential for applications in the exposure of complex structures such as meta-surface and meta-lens.…”
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3D multi-site hydrogen evolution reaction catalysts on nanoimprinted surfaces, structured via multi-photon lithography derived masks by Alexander Jelinek, Daniela Neumüller, Christoph Gammer, Jürgen Eckert, Daniel Kiener

“…The current study aims to develop a reliable and facile 3-step (re-)production technique for manufacturing structured surfaces by combining multi-photon lithography (MPL) and nanoimprint lithography (NIL). …”
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DOF Enhanced via the Multi-Wavelength Method for the Moiré Fringe-Based Alignment by Kairui Zhang, Haifeng Sun, Dajie Yu, Song Hu, Junbo Liu, Ji Zhou

“…Alignment systems are core subsystems of lithography, which directly affect the overlay accuracy of the lithography process. …”
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Induced Effects of Nano-Patterned Substrates on the Electrical and Photo-Electrical Properties of PTB7-Th:ICBA (1:1, wt.%) Bulk-Heterojunction Solar Cells by Tudor Suteu, Vlad-Andrei Antohe, Stefan Antohe, Ionel Stavarache, Maria Cristina Balasin, Gabriel Socol, Marcela Socol, Oana Rasoga, Sorina Iftimie

“…The samples discussed in this paper were fabricated and characterized in air; we can admit that the results are encouraging, but further optimization is needed.…”
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Dry etch performance of Novolak-based negative e-beam resist by Rahul Singh, Christian Vinther Bertelsen, Maria Dimaki, Winnie Edith Svendsen

“…Recent comparisons of negative EBL resists have revealed promising results for AR-N 7520 in terms of resolution and adaptability with other lithography techniques. In this article, we conduct an exploration of patterning of AR-N 7520 (new) for EBL, addressing key parameters in achieving optimal patterning fidelity. …”
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Study on the Influence of Local High Steps on the Uniformity of Global Critical Dimension in Implant Layers by WANG Qiang; WU Tingxi; SONG Shuaidi

“…The CD uniformity of implant layers lithography is increased by 49.4%.…”
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Influence of heat-assisted vat photopolymerization on the physical and mechanical characteristics of dental 3D printing resins by Jung-Hwa Lim, Seung-Ho Shin, Young-Eun Jung, Hongseok An, Jong-Eun Kim

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Laser-based 3D printing and optical characterization of optical micro-nanostructures inspired by nocturnal insects compound eyes by Bogdan Stefanita Calin, Roxana Cristina Popescu, Eugenia Tanasa, Irina Alexandra Paun

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