-
21
Mechanism of Impurity Content in Degradation and Damage Characteristics of Calcium Fluoride Crystals by X-Ray and Deep-Ultraviolet Laser Irradiation
Published 2025-06-01“…Calcium fluoride (CaF<sub>2</sub>) crystals are widely utilized in deep-ultraviolet (DUV) lithography due to their excellent optical properties. …”
Get full text
Article -
22
Micro-nanojauges design to monitor surface mechanical state during high temperature oxidation of metals with application to 17-4PH stainless steel
Published 2024-10-01“…The experimental determination of the optimized gauges material for high temperature oxidation was validated. …”
Get full text
Article -
23
Technologies for Fabricating Large-Size Diffraction Gratings
Published 2025-03-01“…This paper reviews the fabrication technologies for large diffraction gratings, including grating tiling technology, grating ruling technology, single-exposure lithography, optical mosaic grating technology, and scanning beam interference lithography. …”
Get full text
Article -
24
OPTIMIZATION AND CHARACTERIZATION OF ELECTRON BEAM RESIST USING ATOMIC FORCE MICROSCOPY
Published 2012-01-01“…<p>Resis negatif ma-N 2403 dan 495 K PMMA memiliki resolusi yang baik untuk aplikasi litografi berkas elektron (EBL). Ketebalanresist optimal memainkan peran penting dalam paparan berkas elektron. …”
Get full text
Article -
25
Improved method to optimize the phase jump of multiple exposure-tiled gratings
Published 2024-01-01Get full text
Article -
26
-
27
Fabrication and optimization of a multielectrode microfluidic electrochemical flow cell for fast and dynamic detection of reaction products
Published 2025-06-01“…Details of the fabrication of the electrodes and polydimethylsiloxane channel using soft lithography methods are given. Calibration of the collection efficiencies and transit times between electrodes validate the use of these cells for fast electrochemical detection of soluble species. …”
Get full text
Article -
28
-
29
Comprehensive Analysis on Complementary FET
Published 2025-01-01“…Topics include gate stack solutions for BTI reliability, design rule considerations, heterogeneous stacked RRAM integration, device and system co-optimization, and electrothermal characterization. The semiconductor industry’s transition focuses on the utilization of (EUV) Extreme Ultraviolet lithography for three-nanometer logic processes of CFET and proposing novel CDU and process window analysis techniques. …”
Get full text
Article -
30
An Analytical Model for Aerostatic Thrust Bearings Based on the Average Pressure of the Area Surrounded by Orifice
Published 2025-03-01“…Aerostatic thrust bearings are widely used in advanced equipment such as lithography machines due to their excellent lubrication performance. …”
Get full text
Article -
31
A microchip for exosome isolation that can be impregnated with imatinib simultaneously: an in vitro analysis
Published 2024-03-01“…The current investigation utilized a soft lithography technique to fabricate channels for exosome separation, incorporating immunoaffinity capabilities. …”
Get full text
Article -
32
Design and fabrication of asymmetric Mach-Zehnder interferometers based on EpoClad and EpoCore strip waveguides
Published 2024-01-01“…In this work, we present a design optimization method and fabrication results by e-beam lithography for integrated asymmetric Mach-Zehnder interferometers based on strip waveguides made from EpoClad and EpoCore polymers. …”
Get full text
Article -
33
Development and Performance Analysis of Pneumatic Soft-Bodied Bionic Basic Execution Unit
Published 2020-01-01“…Response surface analysis and numerical simulation algorithm are used to determine the optimal combination of structural dimension parameters by taking the maximum output bending angle of the basic executing unit as the optimization objective. …”
Get full text
Article -
34
Design and implementation of a lab-on-a-chip for assisted reproductive technologies
Published 2024-07-01“…The microfluidic chip was modeled and simulated using COMSOL Multiphysics® 5.2 software to optimize and enhance its design and performance. The microfluidic chip was fabricated using conventional injection molding techniques on a polydimethylsiloxane substrate by employing soft lithography methods. …”
Get full text
Article -
35
A Dual-Servo Stage With 6 D.O.F. Magnetically Levitated Fine Stage
Published 2025-01-01“…The magnetic flux is analytically modeled and verified via FEM simulations. Optimization is also performed to determine optimal design values. …”
Get full text
Article -
36
Acoustic resonant imaging technique for characterization ofphotoresist properties depending on hard bake temperature
Published 2025-03-01“… Photoresists are essential materials in semiconductor fabrication, specifically in lithography, where their physical and chemical properties influence pattern generation. …”
Get full text
Article -
37
Rapid assembly of highly ordered DNA origami lattices at mica surfaces
Published 2025-05-01“…Abstract The surface-assisted assembly of DNA origami lattices is a potent method for creating molecular lithography masks. Lattice quality and assembly kinetics are controlled by various environmental parameters, including the employed surface, the assembly temperature, and the ionic composition of the buffer, with optimized parameter combinations resulting in highly ordered lattices that can span surface areas of several cm2. …”
Get full text
Article -
38
Metasurface-based large field-of-view light receiver for enhanced LiDAR systems
Published 2025-07-01“…A general design principle for the metasurface-based light receiver with large FOV capability is proposed, leveraging mapping relations to achieve optimal performance. As a proof of concept, a 20-mm-diameter 4-region metasurface device was designed and fabricated by deep ultraviolet (DUV) projection stepper lithography on an 8-inch fused silica wafer. …”
Get full text
Article -
39
Self‐Aligned Heterojunction Gate Carbon Nanotube Phototransistors for Highly Sensitive Infrared Detection
Published 2025-07-01“…However, huge room is remained on optimizing device structure to further improve the performance, integrated density and yield. …”
Get full text
Article -
40
Enhanced etch characteristics of EUV PR masked SiON through the ion beam grid pulsing technique
Published 2025-06-01“…Abstract EUV lithography technology, applied in nano-patterning processes, enables the creation of fine patterns below 10 nm. …”
Get full text
Article