Showing 21 - 40 results of 62 for search 'optimal lithography', query time: 0.07s Refine Results
  1. 21

    Mechanism of Impurity Content in Degradation and Damage Characteristics of Calcium Fluoride Crystals by X-Ray and Deep-Ultraviolet Laser Irradiation by Ping Han, Dapeng Jiang, Huamin Kou, Rongrong Liu, Qinghui Wu, Zhonghan Zhang, Zhen Zhang, Chong Shan, Chongyun Shao, Yafei Lian, Yuanan Zhao, Xing Peng, Liangbi Su

    Published 2025-06-01
    “…Calcium fluoride (CaF<sub>2</sub>) crystals are widely utilized in deep-ultraviolet (DUV) lithography due to their excellent optical properties. …”
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    Article
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    Technologies for Fabricating Large-Size Diffraction Gratings by Changfeng Shao, Xinghui Li

    Published 2025-03-01
    “…This paper reviews the fabrication technologies for large diffraction gratings, including grating tiling technology, grating ruling technology, single-exposure lithography, optical mosaic grating technology, and scanning beam interference lithography. …”
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    Article
  4. 24

    OPTIMIZATION AND CHARACTERIZATION OF ELECTRON BEAM RESIST USING ATOMIC FORCE MICROSCOPY by - Sutikno

    Published 2012-01-01
    “…<p>Resis negatif ma-N 2403 dan 495 K PMMA memiliki resolusi yang baik untuk aplikasi litografi berkas elektron (EBL). Ketebalanresist optimal memainkan peran penting dalam paparan berkas elektron. …”
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    Fabrication and optimization of a multielectrode microfluidic electrochemical flow cell for fast and dynamic detection of reaction products by Espen Vinge Fanavoll, David A. Harrington, Svein Sunde, Frode Seland

    Published 2025-06-01
    “…Details of the fabrication of the electrodes and polydimethylsiloxane channel using soft lithography methods are given. Calibration of the collection efficiencies and transit times between electrodes validate the use of these cells for fast electrochemical detection of soluble species. …”
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    Article
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    Comprehensive Analysis on Complementary FET by Ayush Bhardwaj, Debashish Dash, Aditi Anant, Ved M. Bhanushali, Adarsh Kushwah, Ipshita Mishra, Shubham, Chandan Kumar Pandey

    Published 2025-01-01
    “…Topics include gate stack solutions for BTI reliability, design rule considerations, heterogeneous stacked RRAM integration, device and system co-optimization, and electrothermal characterization. The semiconductor industry&#x2019;s transition focuses on the utilization of (EUV) Extreme Ultraviolet lithography for three-nanometer logic processes of CFET and proposing novel CDU and process window analysis techniques. …”
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    Article
  10. 30

    An Analytical Model for Aerostatic Thrust Bearings Based on the Average Pressure of the Area Surrounded by Orifice by Jian Zheng, Jianwei Wu, Huan Liu, Jiyao Wang, Pengyue Zhao

    Published 2025-03-01
    “…Aerostatic thrust bearings are widely used in advanced equipment such as lithography machines due to their excellent lubrication performance. …”
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    Article
  11. 31

    A microchip for exosome isolation that can be impregnated with imatinib simultaneously: an in vitro analysis by Amir Monfaredan, Fakher Rahim, Gholamreza Tavoosidana, Mohammad Hossein Modarressi, Alaviyehsadat Hosseininasab, Ali-Akbar Aghajani-Afrouzi, Mahdi Shafiee Sabet, Elahe Motevaseli

    Published 2024-03-01
    “…The current investigation utilized a soft lithography technique to fabricate channels for exosome separation, incorporating immunoaffinity capabilities. …”
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    Article
  12. 32

    Design and fabrication of asymmetric Mach-Zehnder interferometers based on EpoClad and EpoCore strip waveguides by Magalhães Tiago E.C., Borme Jérôme, Douglas Temple, Maibohm Christian, Nieder Jana B.

    Published 2024-01-01
    “…In this work, we present a design optimization method and fabrication results by e-beam lithography for integrated asymmetric Mach-Zehnder interferometers based on strip waveguides made from EpoClad and EpoCore polymers. …”
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    Article
  13. 33

    Development and Performance Analysis of Pneumatic Soft-Bodied Bionic Basic Execution Unit by Yu Zhang, Wenchuan Zhao, Ning Wang, Dengyu Lu

    Published 2020-01-01
    “…Response surface analysis and numerical simulation algorithm are used to determine the optimal combination of structural dimension parameters by taking the maximum output bending angle of the basic executing unit as the optimization objective. …”
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    Article
  14. 34

    Design and implementation of a lab-on-a-chip for assisted reproductive technologies by Firooz Safaefar, Javad Karamdel, Hadi Veladi, Masoud Maleki

    Published 2024-07-01
    “…The microfluidic chip was modeled and simulated using COMSOL Multiphysics® 5.2 software to optimize and enhance its design and performance. The microfluidic chip was fabricated using conventional injection molding techniques on a polydimethylsiloxane substrate by employing soft lithography methods. …”
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    Article
  15. 35

    A Dual-Servo Stage With 6 D.O.F. Magnetically Levitated Fine Stage by Myeonghyeon Kim, Jae-Heon Jeong

    Published 2025-01-01
    “…The magnetic flux is analytically modeled and verified via FEM simulations. Optimization is also performed to determine optimal design values. …”
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    Article
  16. 36

    Acoustic resonant imaging technique for characterization ofphotoresist properties depending on hard bake temperature by Hyelin Kim, Hironori Tohmyoh

    Published 2025-03-01
    “… Photoresists are essential materials in semiconductor fabrication, specifically in lithography, where their physical and chemical properties influence pattern generation. …”
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  17. 37

    Rapid assembly of highly ordered DNA origami lattices at mica surfaces by Bhanu Kiran Pothineni, Jörg Barner, Guido Grundmeier, David Contreras, Mario Castro, Adrian Keller

    Published 2025-05-01
    “…Abstract The surface-assisted assembly of DNA origami lattices is a potent method for creating molecular lithography masks. Lattice quality and assembly kinetics are controlled by various environmental parameters, including the employed surface, the assembly temperature, and the ionic composition of the buffer, with optimized parameter combinations resulting in highly ordered lattices that can span surface areas of several cm2. …”
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  18. 38

    Metasurface-based large field-of-view light receiver for enhanced LiDAR systems by Guo Hanwen, Zhou Xiangkun, Gao Bo, Yang Jianing, Zhang Lingyun, Wang Junya, You Zheng

    Published 2025-07-01
    “…A general design principle for the metasurface-based light receiver with large FOV capability is proposed, leveraging mapping relations to achieve optimal performance. As a proof of concept, a 20-mm-diameter 4-region metasurface device was designed and fabricated by deep ultraviolet (DUV) projection stepper lithography on an 8-inch fused silica wafer. …”
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  19. 39

    Self‐Aligned Heterojunction Gate Carbon Nanotube Phototransistors for Highly Sensitive Infrared Detection by Jingjing Ge, Xiaolu Xia, Maguang Zhu, Shaoyuan Zhou, Yifu Sun, Hangqi Ma, Xinyue Pei, Dijie Zhang, Ying Wang, Zhiyong Zhang

    Published 2025-07-01
    “…However, huge room is remained on optimizing device structure to further improve the performance, integrated density and yield. …”
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    Article
  20. 40

    Enhanced etch characteristics of EUV PR masked SiON through the ion beam grid pulsing technique by Hae In Kwon, Yun Jong Jang, Kyoung Chan Kim, Hong Seong Gil, Ju Young Kim, Seong Hyun Ryu, Do Seong Pyun, Dae Whan Kim, Woo Chang Park, Ji Yeon Lee, Jin Woo Park, Sang Wuk Park, Geun Young Yeom

    Published 2025-06-01
    “…Abstract EUV lithography technology, applied in nano-patterning processes, enables the creation of fine patterns below 10 nm. …”
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    Article